History & Accomplishments

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History & Accomplishments
A-Tech System
       
위・아래 삭제 복제 복제전송 텍스트기본스타일
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PeriodMajor revolution
1995FebruaryA-Tech System founded
NovemberDeveloped ion beam source
1996SeptemberDeveloped arc source
1997OctoberDeveloped filtered cathodic vacuum arc system and process 1998
1998FebruaryDevelopment of High Temperature (1200 °C) High Speed Rotation (750 RPM) Substrate for PECVD (Plasma-Enhanced CVD)
MayDevelopment of a Sputter System for Mass Production
JulyDevelopment of Mass Production Sputter System for SAW Filter
1999JulyDeveloped LPCVD for nanotube synthesis
2000NovemberOpened Bucheon factory in Bucheon Techno Park
2001FebruaryEstablished R&D center
SeptemberDeveloped silica PECVD system
2002JanuaryDeveloped UHV(Ultra High Vacuum) sputtering system
JanuaryParticipated in PDP manufacturing technology development project(supervised by KIMM)
AprilDeveloped silica TCP (Transformer Coupled Plasma) etcher
AugustProduced UHV-sputter system for ferromagnetic multilayers
SeptemberProduced vacuum arc system for nitrides deposition
2003MarchFabricated in-line system of vacuum arc deposition for protecting PDP electrodes
NovemberProduced a high vacuum test system for a flat light source evaluation
2004JanuaryDeveloped a multifunctional standard sputtering system for R&D
JulyAgreed on the partnership with Atomate(USA) in the field of nanotube and nanowire
2005JulyAgreed on the partnership with FEP(Fraunhofer Institut Elektronenstrahl-und Plasmatechnik) and FHR in the field of PVD
OctoberA-Tech System developed MOCVD system with Atomate(USA)
SeptemberA-Tech System, new factory completion
A-Tech System, developed the NPPN(New Post Plasma Nitriding) System
DecemberCompletion of headquarters and 1st plant/ transfer of business establishment (based on Cheongcheon-dong, Bupyeong-gu, Incheon)
DecemberA-Tech System manufactured the sputter for polygon mirror applicable to laser printer
2006MarchA-Tech System produced a production scale of arc ion plating (AIP) system
OctoberA-Tech System manufactured a production scale of AIP and NPPN systems
NovemberA-Tech System developed a commercial ion plating system for various coloration
2007AprilA-Tech System developed a pilot scale of arc discharge equipment for CNT transparent electrode
SeptemberA-Tech System developed a sputter web coater for flexible display research
DecemberA-Tech System developed a sputter system for ophthalmic
2008JanuaryA-Tech System developed polycrystalline silicon ingot growing equipment
JuneA-Tech System developed a PECVD system for anti-reflective coatings on solar cell
2009AugustA-Tech System developed a PECVD system for graphene deposition
OctoberA-Tech System installed a thermal CVD system at HCM city National University in Vietnam and supplied a process condition.
2010MarchA-Tech system developed a Al plasma nitriding equipment for mass production with KAITECH
2011AprilBuilt the second factory
2012AprilSigned business partnership with WESI(Taiwan)
DecemberCompleted 10nm resolution of FIB (Focused Ion Beam) system development
2013DecemberCompleted manufacturing scale of plasma nitriding and DLC PECVD equipment development
2014MarchDevelopment and Fabrication of Ball Mill System
AugustDevelopment of 4-inch scale Vertical Growth CNT Process Optimization
AugustCompleted sputtering system development for nanofoil fabrication
AugustCodeveloped bio-chip with nano holes using FIB with Gacheon Univ., Chungang Univ. and KTL
2016DecemberDevelopment and completion of the project to develop T+2B Prototypes of Nanofusion Industry Union (Constructing the Large Area CNT Forest and producing CNT
2017AugustParticipation in the Industrial Core Technology Development Project of the Ministry of Commerce, Industry and Energy - Development of 1-ton plasma nitrification equipment (main authority: Korea Institute of Production Technology)
2018FebruarySales and joint research of vertical orientation CNT forest and CNT yarn (Sunggyungwan University, Hanyang University, Korea Carbon Convergence Technology Institute, etc.)
       
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PeriodAward/certification/patent and thesis details
2003JulyHigh Density PECVD (Korea Semiconductor Equipment Association) Award
2004SeptemberISO 14001 Acquisition
2006FebruaryKorea Occupational Safety and Technology Corporation's Clean Business Center Recognized
2008SeptemberISO 9001 Acquisition
2008NovemberKorea Institute of Production Technology Partner Designation
2010JanuaryUNITEF Award for Excellence in Research (Joint Research: Inha University Professor Chung Ji-won)
MayNano Technology Integration Center of Electronics and Components Research Institute of Korea
JulyThe combined growth value of carbon nanotubes using the arc shielding
JulyPatents - Double-sided, multi-layer laminated device of substrate using Reactive Sputtering process
AugustIncheon Metropolitan City's selection of promising small and medium-sized enterprises
OctoberINNO-BIZ(기신중소음)인연장재교부
2011MayCE Certification (OLED Purification Furnace)
NovemberIncheon Metropolitan City Certification of Non-Company Company
2012MarchCE authentication (Graphen PECVD-PVD cluster system)
2013AugustCE certification (CVD and CNT Yaring system for CNT support synthesis)
OctoberIdentification of Innovative Small and Medium Business (INNO-BIZ) under the auspices of the Small and Medium Business Administration
2014JuneCE certification (High Temperature)
AugustCE Authentication (Vertical Rawth CVD System)
2017MayPublish a CNT-related thesis (Joint Research: Advanced Functional Materials, 27(30), 17011108)
2018FebruaryPublish a CNT-related thesis (Joint Research Team, Advanced Functional Materials, 280, 1706007) by Professor Seo Dong-seok of Sungkyunkwan University